New paper in Nanotechnology: Altering the radiation chemistry of electron-beam lithography with a reactive gas: a study of Teflon AF patterning under water vapor

UK ECE graduate students Mansoor Sultan and Sarah Lami, along with collaborators in UK Physics, have published a new paper in Nanotechnology entitled, "Altering the radiation chemistry of electron-beam lithography with a reactive gas: a study of Teflon AF patterning under water vapor."  The paper addresses a new approach to electron-beam lithography in which the exposure process is altered by the presence of water vapor. 

The full paper can be found at https://doi.org/10.1088/1361-6528/ab16f7.