New paper in Nanotechnology: Real-time dose control for electron-beam lithography

Former UK ECE graduate students Yugu Yang and Stephen Maloney recently published their work on "Real-time dose control for electron-beam lithography" in Nanotechnology.  Electron-beam lithography is the primary patterning technique for integrated circuit mask making and low-volume manufacturing of nanoscale devices.  The electron dose controls the critical dimensions of transistors and other nanoscale features.  This paper describes the first step toward controlling this dose in real-time during patterning by using a fluorescent layer on the substrate.

The paper can be found at https://doi.org/10.1088/1361-6528/abcaca.