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Schematic of VP-EBL. When performing EBL on insulating substrates, the bulk of the sample charges negatively by trapping primary electrons. Introducing a gas in the chamber can mitigate this charging process because the gas molecules may be ionized by electron impact. Typically, multiple ions are generated through a cascade as secondary electrons are accelerated toward the biased detector.

Enhancing Contrast and Resolution for Electron-Beam Lithography on Insulating Substrates Enhancing Contrast and Resolution for Electron-Beam Lithography on Insulating Substrates The effect of ambient gas on the contrast and the resolution of electron beam lithography (EBL) in gaseous environments on insulating substrates.

Deepak Kumar , Cooper Meyers, RJ L. Smith, and J. Todd Hastings , Senior Member, IEEE

Oct 30, 2025

Nanotechnology

Full article published in IEEE Transactions on Nanotechnology at ieeexplore.ieee.org/document/11202715

Schematic of VP-EBL. When performing EBL on insulating substrates, the bulk of the sample charges negatively by trapping primary electrons. Introducing a gas in the chamber can mitigate this charging process because the gas molecules may be ionized by electron impact. Typically, multiple ions are generated through a cascade as secondary electrons are accelerated toward the biased detector.

Enhancing Contrast and Resolution for Electron-Beam Lithography on Insulating Substrates Enhancing Contrast and Resolution for Electron-Beam Lithography on Insulating Substrates The effect of ambient gas on the contrast and the resolution of electron beam lithography (EBL) in gaseous environments on insulating substrates.

Deepak Kumar , Cooper Meyers, RJ L. Smith, and J. Todd Hastings , Senior Member, IEEE

Oct 30, 2025

Nanotechnology

Full article published in IEEE Transactions on Nanotechnology at ieeexplore.ieee.org/document/11202715

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